High-sensitive Negative Resist Materials Based on Polysilane Derivatives.
نویسندگان
چکیده
منابع مشابه
Polystyrene negative resist for high-resolution electron beam lithography
We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL) resist, with the goal of finding the ultimate achievable resolution. It demonstrated fairly well-defined patterning of a 20-nm period line array and a 15-nm period dot array, which are the densest patterns ever achieved using organic EBL resists. Such dense patterns can be ach...
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0167-9317/$ see front matter 2012 Elsevier B.V. A http://dx.doi.org/10.1016/j.mee.2012.07.005 ⇑ Corresponding author. Tel.: +1 519 729 3582. E-mail addresses: [email protected], j24 (J. Zhang). Previously we demonstrated ultra-dense patterning using 2 kg/mol polystyrene negative electron beam resist that has low sensitivity [16]. To drastically improve its sensitivity, here we studied the expos...
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Department of Materials Science and E Technology, 77 Massachusetts Avenue, Cam mit.edu Department of Chemistry, Massachusetts I Avenue, Cambridge, MA, 02139, USA † Electronic supplementary information ( compounds 1–8 and polydiacetylenes, a d compounds 5–8, packing structures of polymer 3, thermochromism of polym compounds 1–8 during charging or compound 1, kinetic studies on therm compounds 3–...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2000
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.13.395